Metrology & Instrumentation
Process Equipment
Epitaxial Equipment
Epitaxial Equipment : MBE Components
MBE Source Flanges
MBE Source Flanges
Veeco Source Flanges enable users to add molecular beam epitaxy (MBE)-type deposition capabilities to ultra-high vacuum (UHV) reactors. The flanges are compatible with many MBE sources, and can help grow many types of epitaxial films. The most common source flange style, with no part projecting into the UHV reactor, is suited when "source-to-substrate" distances are 4"-10"/102mm-254mm. With greater source-to-substrate distances, available sources and their cooling shroud may be inserted into the reactor. Source flange selection is based on outside diameter of the main flange, the desired number of cell ports, and the nominal source-to-substrate distance. This information determines the availability of other options.
Veeco Source Flanges enable users to add molecular beam epitaxy (MBE)-type deposition capabilities to ultra-high vacuum (UHV) reactors. The flanges are compatible with many MBE sources, and can help grow many types of epitaxial films. The most common source flange style, with no part projecting into the UHV reactor, is suited when "source-to-substrate" distances are 4"-10"/102mm-254mm. With greater source-to-substrate distances, available sources and their cooling shroud may be inserted into the reactor. Source flange selection is based on outside diameter of the main flange, the desired number of cell ports, and the nominal source-to-substrate distance. This information determines the availability of other options.