Metrology & Instrumentation
Process Equipment
Epitaxial Equipment
Epitaxial Equipment : MOCVD Systems
E450 As/P MOCVD System
E450 As/P MOCVD System
Engineered for the high volume production of epitaxial materials, the E450 provides a level of process control and reliability formerly unavailable for large-scale MOCVD production tools. Along with next generation growth chamber and Flow Flange designs, the E450 features exclusive RealTemp optical control technology, which provides in-situ monitoring and control of wafer temperature during production runs. When combined with standard components, including a cassette to cassette system for extremely clean wafer transfer, these advancements in deposition technology result in exceptional material quality, process efficiency, and wafer throughput. In order to facilitate the high volume production of sensitive materials while ensuring the amount of resources needed for deposition remains at a cost effective level, our engineers designed the E450 growth chamber to improve flow conditions and efficiently utilize reactants. As with all of our MOCVD tools, the E450 features the exclusive TurboDisc® technology platform, which utilizes a vertical growth chamber configuration to accomplish exceptional thickness, doping, and composition uniformity.
Engineered for the high volume production of epitaxial materials, the E450 provides a level of process control and reliability formerly unavailable for large-scale MOCVD production tools. Along with next generation growth chamber and Flow Flange designs, the E450 features exclusive RealTemp optical control technology, which provides in-situ monitoring and control of wafer temperature during production runs. When combined with standard components, including a cassette to cassette system for extremely clean wafer transfer, these advancements in deposition technology result in exceptional material quality, process efficiency, and wafer throughput. In order to facilitate the high volume production of sensitive materials while ensuring the amount of resources needed for deposition remains at a cost effective level, our engineers designed the E450 growth chamber to improve flow conditions and efficiently utilize reactants. As with all of our MOCVD tools, the E450 features the exclusive TurboDisc® technology platform, which utilizes a vertical growth chamber configuration to accomplish exceptional thickness, doping, and composition uniformity.