Metrology & Instrumentation
Process Equipment
Epitaxial Equipment
Process Equipment : Ion Beam Deposition
NEXUS LDD-IBD Ion Beam Deposition System
NEXUS LDD-IBD Ion Beam Deposition System
The NEXUS Low Defect Density Ion Beam Deposition System (NEXUS LDD-IBD) deposits extremely thin single and multi-layer film coatings with angstrom accuracy. Specifically designed for low particulate deposition, its excellent uniformity and high repeatability make it ideal for phase shift masks and next-generation lithography technology such as extreme ultra violet (EUV) masks.
Based on award-winning technology, the NEXUS LDD-IBD is a high performance, production-worthy system that can be integrated with other process modules into a cluster tool or used as a single module for R&D or pilot line applications.
The NEXUS Low Defect Density Ion Beam Deposition System (NEXUS LDD-IBD) deposits extremely thin single and multi-layer film coatings with angstrom accuracy. Specifically designed for low particulate deposition, its excellent uniformity and high repeatability make it ideal for phase shift masks and next-generation lithography technology such as extreme ultra violet (EUV) masks.
Based on award-winning technology, the NEXUS LDD-IBD is a high performance, production-worthy system that can be integrated with other process modules into a cluster tool or used as a single module for R&D or pilot line applications.